ZIBO RIKEN MT COATED ABRASIVES CO., LTD.
ZIBO RIKEN MT COATED ABRASIVES CO., LTD.
Characteristics and Applications of Polishing Solution of Polishing Abrasive Materials
Characteristics and Applications of Polishing Solution of Polishing Abrasive Materials

Characteristics and Applications of Polishing Solution of Polishing Abrasive Materials

The requirements of metal, hardware and stainless steel workpieces for polishing abrasive materials are also very high, at the same time, there are requirements in the choice and usage of polishing solution of polishing abrasive materials. 


Firstly, RMC ABRASIVE will introduce the polishing solution of polishing abrasive materials, which is composed of high purity silicon dioxide and other composite abrasives to form the polishing solution of composite polishing abrasive materials with the original particle diameter, then add special modified treating agent to disperse it in the emulsion.


Polishing solution of polishing abrasive materials has properties such as high penetration, high strength, high adhesion, film-forming activity, high weather resistance and strong thixotropy.


1. It has high purity and can effectively reduce the contamination of electronic products

2. The high polishing speed of polishing abrasive materials can be achieved by the evenly dispersed nano-silica particles or other materials.

3. High flatness processing. The polishing of this product use particles of nano-SiO2 and other materials, which will achieve high flatness processing without causing physical damage to the workpiece.


Notes for the use of the polishing solution of polishing abrasive materials: The product will gradually thicken or even freeze after being stored for period of time, so it is recommended to dilute it with 1:1 water and solution in usage. It is suggested to use a dispersion device to stir the solution evenly (for better effect) before adding. When adding, attention should also be paid to the viscosity of the system to avoid heavy flocculation problems caused by too low basic material sviscosity or low rate of shear.


The main applications of polishing solution:

First of all, the polishing solution of polishing abrasive materials is widely used in nanoscale chemico-mechanical polishing such as silicon wafer, compound crystal, precision optics devices, hard disks, gemstones and other nanoscale and sub-nanoscale polishing processing.


Secondly, polishing solution products can not only be used as an additive, but also in water-based adhesives, exterior wall coatings with high weather resistant and other fields.